Chemical mechanical polishing of chemical vapor deposited Co films with minimal corrosion in the Cu/Co/Mn/SiCOH patterned structures

Sagi, K.V.K.V.SagiTeugels, LieveLieveTeugelsvan der Veen, MarleenMarleenvan der VeenStruyf, HerbertHerbertStruyfAlety, S.R.S.R.AletyBabu, S.V.S.V.Babu2021-10-242021-10-2420172162-8769https://imec-publications.be/handle/20.500.12860/29348Chemical mechanical polishing of chemical vapor deposited Co films with minimal corrosion in the Cu/Co/Mn/SiCOH patterned structuresJournal articlehttp://jss.ecsdl.org/content/6/5/P276.abstract