Tsai, WilmanWilmanTsaiNohira, HiroshiHiroshiNohiraCarter, RichardRichardCarterCaymax, MattyMattyCaymaxConard, ThierryThierryConardDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeynsPétry, JasmineJasminePétryRichard, OlivierOlivierRichardVandervorst, WilfriedWilfriedVandervorstYoung, EdwardEdwardYoungZhao, ChaoChaoZhaoMaes, JosJosMaesTuominen, MarkoMarkoTuominen2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5715Interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor depositionOral presentation