Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography

Holzmeier, FabianFabianHolzmeierDorney, KevinKevinDorneyWitting Larsen, EsbenEsbenWitting LarsenNuytten, ThomasThomasNuyttenSingh, DhirendraDhirendraSinghvan Setten, MichielMichielvan SettenVanelderen, PieterPieterVanelderenBargsten, ClaytonClaytonBargstenCousin, SethSethCousinRaymondson, DaisyDaisyRaymondsonRinard, EricEricRinardWard, RodRodWardKapteyn, HenryHenryKapteynBottcher, StefanStefanBottcherDyachenko, OleksiyOleksiyDyachenkoKremzow, RaimundRaimundKremzowWietstruk, MarkoMarkoWietstrukPourtois, GeoffreyGeoffreyPourtoisvan der Heide, PaulPaulvan der HeidePetersen, JohnJohnPetersen2023-12-042023-06-132023-12-042021-02-22https://imec-publications.be/handle/20.500.12860/41731Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithographyOral presentationhttps://doi.org/10.1117/12.2595038