Short- and damage-free process for patterning magnetic tunnel junctions for high-density application

Radisic, DunjaDunjaRadisicSouriau, LaurentLaurentSouriauParaschiv, VasileVasileParaschivGoossens, DannyDannyGoossensYamashita, FumikoFumikoYamashitaKoizumi, NaoNaoKoizumiTahara, ShigeruShigeruTaharaNishimura, EichiEichiNishimuraKim, WoojinWoojinKimDonadio, Gabriele LucaGabriele LucaDonadioCrotti, DavideDavideCrottiSwerts, JohanJohanSwertsMertens, SofieSofieMertensLin, TsannTsannLinCouet, SebastienSebastienCouetPiumi, DanieleDanielePiumiKar, Gouri SankarGouri SankarKarFurnemont, ArnaudArnaudFurnemont2021-10-222021-10-222015https://imec-publications.be/handle/20.500.12860/25789Short- and damage-free process for patterning magnetic tunnel junctions for high-density applicationMeeting abstract