Analysis of the impact of reticle CD variations on the available process windows for a 100nm CMOS process

Verhaegen, StafStafVerhaegenVandenberghe, GeertGeertVandenbergheJonckheere, RikRikJonckheereRonse, KurtKurtRonse2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/7015Analysis of the impact of reticle CD variations on the available process windows for a 100nm CMOS processProceedings paper