Yang, HongHongYangLuo, WeichunWeichunLuoZhou, LongdaLongdaZhouXu, HaoHaoXuTang, BoBoTangSimoen, EddyEddySimoenYin, HuaxiangHuaxiangYinZhu, HuilongHuilongZhuZhao, ChaoChaoZhaoWang, WenwuWenwuWangYe, TianchunTianchunYe2021-10-262021-10-2620180741-3106https://imec-publications.be/handle/20.500.12860/32323Impact of ALD TiN capping layer on interface trap and channel hot carrier reliability of HKMG nMOSFETsJournal articlehttps://ieeexplore.ieee.org/document/8386832