Investigation of Low-n Mask in 0.33NA EUV Single Patterning at Pitch 28nm Metal Design

Xu, DongboDongboXuGillijns, WernerWernerGillijnsTan, Ling EeLing EeTanPhilipsen, VickyVickyPhilipsenKim, Ryan Ryoung hanRyan Ryoung hanKim2022-09-292022-09-192022-09-202022-09-292022-05-26978-1-5106-4977-40277-786XWOS:000850450900015https://imec-publications.be/handle/20.500.12860/40460Investigation of Low-n Mask in 0.33NA EUV Single Patterning at Pitch 28nm Metal DesignProceedings paper10.1117/12.2614197978-1-5106-4978-1WOS:000850450900015