The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay

van Haren, RichardRichardvan HarenSteinert, SteffenSteffenSteinertMouraille, OrionOrionMourailleD'have, KoenKoenD'haveVan Dijk, LeonLeonVan DijkHermans, JanJanHermansBeyer, DirkDirkBeyer2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/34234The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlayProceedings paperhttps://doi.org/10.1117/12.2535900