Low-leakage Ru-strontium titanate-Ru metal-insulator-metal capacitors for sub-20nm technology node in dynamic random access memory

Popovici, Mihaela IoanaMihaela IoanaPopoviciSwerts, JohanJohanSwertsRedolfi, AugustoAugustoRedolfiKaczer, BenBenKaczerAoulaiche, MarcMarcAoulaicheRadu, IulianaIulianaRaduClima, SergiuSergiuClimaEveraert, Jean-LucJean-LucEveraertVan Elshocht, SvenSvenVan ElshochtJurczak, GosiaGosiaJurczak2021-10-222021-10-2220140003-6951https://imec-publications.be/handle/20.500.12860/24396Low-leakage Ru-strontium titanate-Ru metal-insulator-metal capacitors for sub-20nm technology node in dynamic random access memoryJournal articlehttp://scitation.aip.org/docserver/fulltext/aip/journal/apl/104/8/1.4866860.pdf?expires=1393433532&id=id&accname=guest&checksum=