A ballistic electron-emission microscopy (BEEM)-investigation of the effects of chemical pretreatments on III-V semiconductor Schottky barriers

Van Meirhaeghe, R.R.Van MeirhaegheVanalme, G.G.VanalmeGoubert, L.L.GoubertCardon, F.F.CardonVan Daele, P.P.Van Daele2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/3062A ballistic electron-emission microscopy (BEEM)-investigation of the effects of chemical pretreatments on III-V semiconductor Schottky barriersOral presentation