Langner, AndreasAndreasLangnerSolak, Harun H.Harun H.SolakAuzelyte, VaidaVaidaAuzelyteEkinci, YasinYasinEkinciDavid, ChristianChristianDavidGobrecht, JensJensGobrechtGronheid, RoelRoelGronheidvan Setten, EelcoEelcovan Settenvan Ingen Schenau, KoenKoenvan Ingen SchenauFeenstra, KeesKeesFeenstra2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15651EUV resist contrast loss determination using interference lithographyProceedings paper