Addressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOS

Shickova, AdelinaAdelinaShickovaKauerauf, ThomasThomasKaueraufRothschild, AudeAudeRothschildAoulaiche, MarcMarcAoulaicheSahhaf, SaharSaharSahhafKaczer, BenBenKaczerVeloso, AnabelaAnabelaVelosoTorregiani, CristinaCristinaTorregianiPantisano, LuigiLuigiPantisanoLauwers, AnneAnneLauwersZahid, MohammedMohammedZahidRost, TimTimRostTigelaar, H.H.TigelaarPas, M.M.PasFretwell, J.J.FretwellMcCormack, J.J.McCormackHoffmann, ThomasThomasHoffmannKerner, ChristophChristophKernerChiarella, ThomasThomasChiarellaBrus, StephanStephanBrusHarada, YoshinaoYoshinaoHaradaNiwa, MasaakiMasaakiNiwaKaushik, VidyaVidyaKaushikMaes, HermanHermanMaesAbsil, PhilippePhilippeAbsilGroeseneken, GuidoGuidoGroesenekenBiesemans, SergeSergeBiesemansKittl, JorgeJorgeKittl2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12893Addressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOSProceedings paper