Mask enhancer technology on ArF immersion tool for 45nm-node CMOS with 0.249μm² SRAM contact layer fabrication

Yuito, TakashiTakashiYuitoWiaux, VincentVincentWiauxVan Look, LieveLieveVan LookVandenberghe, GeertGeertVandenbergheIrie, ShigeoShigeoIrieMatsuo, TakahiroTakahiroMatsuoMisaka, AkioAkioMisakaEndo, MasayukiMasayukiEndoSasago, MasaruMasaruSasago2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11599Mask enhancer technology on ArF immersion tool for 45nm-node CMOS with 0.249μm² SRAM contact layer fabricationProceedings paper