Comparison between vacuum ultra-violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching

Zotovich, A.A.ZotovichEl Otell, ZiadZiadEl Otellde Marneffe, Jean-FrancoisJean-Francoisde MarneffeProshina, O.O.ProshinaLopaev, D.D.LopaevRakhimova, T.T.RakhimovaBaklanov, MikhaïlMikhaïlBaklanov2021-10-232021-10-232015https://imec-publications.be/handle/20.500.12860/26255Comparison between vacuum ultra-violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etchingMeeting abstracthttp://pesm-conference.org/files/2015_abstractbook.pdf