Method for in-situ etch uniformity monitoring using plasma emission interferometry

Samara, VladimirVladimirSamarade Marneffe, Jean-FrancoisJean-Francoisde MarneffeEl Otell, ZiadZiadEl OtellEconomou, DemetreDemetreEconomou2021-10-222021-10-2220151071-1023https://imec-publications.be/handle/20.500.12860/25856Method for in-situ etch uniformity monitoring using plasma emission interferometryJournal articlehttp://scitation.aip.org/content/avs/journal/jvstb/33/3/10.1116/1.4917168