Mallik, ArindamArindamMallikVansumere, WimWimVansumereRyckaert, JulienJulienRyckaertMercha, AbdelkarimAbdelkarimMerchaHoriguchi, NaotoNaotoHoriguchiDemuynck, StevenStevenDemuynckBoemmels, JuergenJuergenBoemmelsTokei, ZsoltZsoltTokeiVandenberghe, GeertGeertVandenbergheRonse, KurtKurtRonseThean, AaronAaronTheanVerkest, DiederikDiederikVerkestLebon, HansHansLebonSteegen, AnAnSteegen2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22754The need for EUV lithography at advanced technology for sustainable wafer costProceedings paper