Improved low-k dielectric properties using He/H2 plasma for resist removal

Urbanowicz, AdamAdamUrbanowiczShamiryan, DenisDenisShamiryanMarsik, PremyslPremyslMarsikTravaly, YoussefYoussefTravalyVerdonck, PatrickPatrickVerdonckVanstreels, KrisKrisVanstreelsFerchichi, AbdelkarimAbdelkarimFerchichiDe Roest, DavidDavidDe RoestSprey, HesselHesselSpreyMatsushita, K.K.MatsushitaKaneko, S.S.KanekoTsuji, N.N.TsujiLuo, S.S.LuoEscorcia, O.O.EscorciaBerry, IvanIvanBerryWaldfried, CarloCarloWaldfriedDe Gendt, StefanStefanDe GendtBaklanov, MikhaïlMikhaïlBaklanov2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14590Improved low-k dielectric properties using He/H2 plasma for resist removalMeeting abstract