Gao, WeiminWeiminGaoPhilippou, AlexanderAlexanderPhilippouKlostermann, UlrichUlrichKlostermannSiebert, JoachimJoachimSiebertPhilipsen, VickyVickyPhilipsenHendrickx, EricEricHendrickxVandeweyer, TomTomVandeweyerJonckheere, RikRikJonckheere2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/20704Calibration and verification of a stochastic model for EUV resistProceedings paper