New opportunities in device scaling: How the high performing strained Ge pFINFET can help the space industry?

Mitard, JeromeJeromeMitardWitters, LiesbethLiesbethWittersCollaert, NadineNadineCollaertLinten, DimitriDimitriLintenEneman, GeertGeertEnemanClaeys, CorCorClaeysHeyns, MarcMarcHeynsMocuta, AndaAndaMocutaThean, AaronAaronThean2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/27015New opportunities in device scaling: How the high performing strained Ge pFINFET can help the space industry?Oral presentation