Simultaneous etching and deposition processes during the etching of silicon with a Cl(2)/O(2)/Ar inductively coupled plasma

Tinck, StefanStefanTinckBogaerts, A.A.BogaertsShamiryan, DenisDenisShamiryan2021-10-192021-10-1920111612-8850https://imec-publications.be/handle/20.500.12860/19892Simultaneous etching and deposition processes during the etching of silicon with a Cl(2)/O(2)/Ar inductively coupled plasmaJournal article