Kinetics of defect annihilation in directed self-assembly of block copolymers using chemically nano-patterned surfaces

Rincon Delgadillo, PaulinaPaulinaRincon DelgadilloGronheid, RoelRoelGronheidLin, GuanyangGuanyangLinCao, YiYiCaoRomo, AinhoaAinhoaRomoSomervell, MarkMarkSomervellNafus, KathleenKathleenNafusNealey, PaulPaulNealey2021-10-222021-10-222014https://imec-publications.be/handle/20.500.12860/24431Kinetics of defect annihilation in directed self-assembly of block copolymers using chemically nano-patterned surfacesMeeting abstract