Fenger, GermainGermainFengerLorusso, GianGianLorussoHendrickx, EricEricHendrickxNiroomand, ArdavanArdavanNiroomand2021-10-182021-10-182010-101537-1646https://imec-publications.be/handle/20.500.12860/17102Design correction in extreme ultrviolet lithographyJournal article