A new HF vapor process for native oxide removal, suited for cluster applications

Storm, ArjenArjenStormSprey, HesselHesselSpreyMaes, JanJanMaesGranneman, E.E.GrannemanDe Blank, ReneReneDe BlankRöhr, ErikaErikaRöhrCaymax, MattyMattyCaymaxHeyns, MarcMarcHeyns2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/3857A new HF vapor process for native oxide removal, suited for cluster applicationsProceedings paper