Influence of UV irradiation on the removal of post-etch photoresist in porous low-k dielectric patterning

Kesters, ElsElsKestersLe, Quoc ToanQuoc ToanLeLux, MarcelMarcelLuxOnandia, LauraLauraOnandiaBaerts, ChristinaChristinaBaertsVereecke, GuyGuyVereecke2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15589Influence of UV irradiation on the removal of post-etch photoresist in porous low-k dielectric patterningMeeting abstract