Randall, JohnJohnRandallRonse, KurtKurtRonseMarschner, ThomasThomasMarschnerGoethals, MiekeMiekeGoethalsErcken, MoniqueMoniqueErcken2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/3770Variable threshold resist models for lithography simulationProceedings paper