Surfactinated rinse against pattern collapse and defectivity in 193 nm lithography

Misat, Sylvain IreneeSylvain IreneeMisatGrozev, GrozdanGrozdanGrozevVersluijs, JankoJankoVersluijs2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9307Surfactinated rinse against pattern collapse and defectivity in 193 nm lithographyOral presentation