A novel self-aligned double patterning integrated with Ga+ focused ion beam milling for silicon nanowire definition

Rosa, Andressa MacedoAndressa MacedoRosaLeonhardt, AlessandraAlessandraLeonhardtde Souza, Lais OliveiraLais Oliveirade SouzaBarbosa Lima, Lucas PetersenLucas PetersenBarbosa LimaPuydinger dos Santos, Marcos ViniciusMarcos ViniciusPuydinger dos SantosManera, Leandro TiagoLeandro TiagoManeraDiniz, Jose AlexandreJose AlexandreDiniz2022-01-282021-11-022022-01-2820210167-9317WOS:000609161700001https://imec-publications.be/handle/20.500.12860/38261A novel self-aligned double patterning integrated with Ga+ focused ion beam milling for silicon nanowire definitionJournal article10.1016/j.mee.2020.111493WOS:000609161700001FINFET