Influence of pre and post process conditions on the composition of thin Si3N4 thin films (3nm) studied by XPS and TOFSIMS

Conard, ThierryThierryConardDe Witte, HildeHildeDe WitteVandervorst, WilfriedWilfriedVandervorstHoussa, MichelMichelHoussaHeyns, MarcMarcHeynsPomarede, C.C.PomaredeWerkhoven, ChrisChrisWerkhoven2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4217Influence of pre and post process conditions on the composition of thin Si3N4 thin films (3nm) studied by XPS and TOFSIMSProceedings paper