Integration of porous low-k dielectrics using post porosity pore protection

Zhang, LipingLipingZhangde Marneffe, Jean-FrancoisJean-Francoisde MarneffeVerdonck, PatrickPatrickVerdonckHeylen, NancyNancyHeylenWen, Liang GongLiang GongWenWilson, ChrisChrisWilsonTokei, ZsoltZsoltTokeiBoemmels, JuergenJuergenBoemmelsDe Gendt, StefanStefanDe GendtBaklanov, MikhailMikhailBaklanov2021-10-232021-10-2320160022-3727https://imec-publications.be/handle/20.500.12860/27663Integration of porous low-k dielectrics using post porosity pore protectionJournal articlehttp://iopscience.iop.org/article/10.1088/0022-3727/49/50/505105/meta