Electron channeling contrast imaging: potential for future metrology in semiconductor industry

Vystavel, TomasTomasVystavelProkhodtseva, AnnaAnnaProkhodtsevaSchulze, AndreasAndreasSchulzeCaymax, MattyMattyCaymax2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/27561Electron channeling contrast imaging: potential for future metrology in semiconductor industryMeeting abstracthttp://ma.ecsdl.org/content/MA2016-02/30/1951.abstract?sid=370f3d35-2849-459c-a6eb-20f526c6222b