Hsu, StephenStephenHsuEurlings, MarkMarkEurlingsHendrickx, EricEricHendrickxVan Den Broeke, Douglas J.Douglas J.Van Den BroekeChiou, Tsann-BimTsann-BimChiouFung Chen, J.J.Fung ChenLaidig, Thomas L.Thomas L.LaidigShi, XuelongXuelongShiFinders, JoJoFinders2021-10-152021-10-152004-08https://imec-publications.be/handle/20.500.12860/9070Double dipole lithography for 65-nm node and beyond: a technology readiness reviewProceedings paper