Optimized post-CMP and pre-Epi cleans to enable smooth and high quality epitaxial strained Ge growth on SiGe strain relaxed buffers

Loo, RogerRogerLooSouriau, LaurentLaurentSouriauOng, PatrickPatrickOngKenis, KarineKarineKenisRip, JensJensRip2021-10-202021-10-2020121662-9779https://imec-publications.be/handle/20.500.12860/21056Optimized post-CMP and pre-Epi cleans to enable smooth and high quality epitaxial strained Ge growth on SiGe strain relaxed buffersJournal article