Nucleation behavior of III/V crystal selectively grown inside nano-trenches: the influence of trench width

Jiang, SijiaSijiaJiangMerckling, ClementClementMercklingMoussa, AlainAlainMoussaWaldron, NiamhNiamhWaldronCaymax, MattyMattyCaymaxVandervorst, WilfriedWilfriedVandervorstCollaert, NadineNadineCollaertBarla, KathyKathyBarlaLanger, RobertRobertLangerThean, AaronAaronTheanSeefeldt, MarcMarcSeefeldtHeyns, MarcMarcHeyns2021-10-222021-10-2220152162-8769https://imec-publications.be/handle/20.500.12860/25434Nucleation behavior of III/V crystal selectively grown inside nano-trenches: the influence of trench widthJournal articlehttp://jss.ecsdl.org/content/4/7/N83.abstract?etoc