Diameter-dependent boron diffusion in silicon nanowire-based transistors

Schulze, AndreasAndreasSchulzeFlorakis, AntoniosAntoniosFlorakisHantschel, ThomasThomasHantschelEyben, PierrePierreEybenVerhulst, AnneAnneVerhulstRooyackers, RitaRitaRooyackersVandooren, AnneAnneVandoorenVandervorst, WilfriedWilfriedVandervorst2021-10-212021-10-2120130003-6951https://imec-publications.be/handle/20.500.12860/23058Diameter-dependent boron diffusion in silicon nanowire-based transistorsJournal article