Effect of different oxide and hybrid precursors on MOF-CVD of ZIF-8 films

Cruz, Alexander JohnAlexander JohnCruzArnauts, GielGielArnautsObst, MartinMartinObstKravchenko, Dmitry E.Dmitry E.KravchenkoVereecken, PhilippePhilippeVereeckenDe Feyter, StevenStevenDe FeyterStassen, IvoIvoStassenHauffman, TomTomHauffmanAmeloot, RobRobAmeloot2023-08-072023-06-202023-08-0720211477-9226WOS:000648620500001https://imec-publications.be/handle/20.500.12860/42008Effect of different oxide and hybrid precursors on MOF-CVD of ZIF-8 filmsJournal article10.1039/d1dt00927cWOS:000648620500001METAL-ORGANIC FRAMEWORKSMOLECULAR LAYER DEPOSITIONCHEMICAL-VAPOR-DEPOSITIONFREE POWDER SYNTHESISELECTRONIC DEVICESZINC-OXIDETHIN-FILMSCONVERSIONROADMAPMEDLINE:33969844