Assessing the prospects of atomic layer deposition for two-dimensional materials in microelectronic applications

Groven, BenjaminBenjaminGrovenTomczak, YoannYoannTomczakNalin Mehta, AnkitAnkitNalin MehtaBender, HugoHugoBenderZhang, HaodongHaodongZhangSchram, TomTomSchramSmets, QuentinQuentinSmetsHeyns, MarcMarcHeynsCaymax, MattyMattyCaymaxRadu, IulianaIulianaRaduDelabie, AnneliesAnneliesDelabie2021-10-252021-10-252018https://imec-publications.be/handle/20.500.12860/30811Assessing the prospects of atomic layer deposition for two-dimensional materials in microelectronic applicationsMeeting abstract