Accurate prediction of device performance in sub-10nm WFIN FinFETs using scalpel SSRM-based calibration of process simulations

Eyben, PierrePierreEybenMatagne, PhilippePhilippeMatagneChiarella, ThomasThomasChiarellaDe Keersgieter, AnAnDe KeersgieterKubicek, StefanStefanKubicekMitard, JeromeJeromeMitardMocuta, AndaAndaMocutaHoriguchi, NaotoNaotoHoriguchiThean, AaronAaronTheanMocuta, DanDanMocuta2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26607Accurate prediction of device performance in sub-10nm WFIN FinFETs using scalpel SSRM-based calibration of process simulationsProceedings paperhttp://ieeexplore.ieee.org/document/7605203