Atomically controlled processing for Ge CVD epitaxial growth

Murota, JunichiJunichiMurotaYamamoto, YuchiYuchiYamamotoCostina, IoanIoanCostinaTillack, BerndBerndTillackLe Thanh, VinVinLe ThanhLoo, RogerRogerLooCaymax, MattyMattyCaymax2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/27060Atomically controlled processing for Ge CVD epitaxial growthProceedings paperhttp://ieeexplore.ieee.org/document/7998908/