Nitrogen incorporation in HfSiO(N)/TaN gate stacks: impact on performances and NBTI

Aoulaiche, MarcMarcAoulaicheHoussa, MichelMichelHoussaDeweerd, WimWimDeweerdTrojman, LionelLionelTrojmanConard, ThierryThierryConardMaes, JanJanMaesDe Gendt, StefanStefanDe GendtGroeseneken, GuidoGuidoGroesenekenHeyns, MarcMarcHeyns2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/11648Nitrogen incorporation in HfSiO(N)/TaN gate stacks: impact on performances and NBTIJournal article