Narrow pitch dual damascene patterning using EUV lithography in association with a spin-on trilayer resist system

Lazzarino, FredericFredericLazzarinoTruffert, VincentVincentTruffertVereecke, BartBartVereeckeDemuynck, StevenStevenDemuynck2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19255Narrow pitch dual damascene patterning using EUV lithography in association with a spin-on trilayer resist systemMeeting abstract