Cleaning, rinsing and drying aspects in post-Cu-CMP clean

Fyen, WimWimFyenVos, RitaRitaVosTeerlinck, IvoIvoTeerlinckVrancken, EviEviVranckenGrillaert, JoostJoostGrillaertMeuris, MarcMarcMeurisHeyns, MarcMarcHeyns2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3457Cleaning, rinsing and drying aspects in post-Cu-CMP cleanOral presentation