A low-cost poly-sidewall erase HIMOSTM technology for 130-90nm embedded flash memories

Van Houdt, JanJanVan HoudtHaspeslagh, LucLucHaspeslaghWellekens, DirkDirkWellekensDe Vos, JoeriJoeriDe VosHendrickx, PaulPaulHendrickxTsouhlarakis, JorgoJorgoTsouhlarakis2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9763A low-cost poly-sidewall erase HIMOSTM technology for 130-90nm embedded flash memoriesOral presentation