Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms

Lodha, Jayant KumarJayant KumarLodhaMeersschaut, JohanJohanMeersschautPasquali, MattiaMattiaPasqualiBillington, HansHansBillingtonDe Gendt, StefanStefanDe GendtArmini, SilviaSilviaArmini2024-09-122024-08-052024-09-1220242079-4991WOS:001278697800001https://imec-publications.be/handle/20.500.12860/44272Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation MechanismsJournal article10.3390/nano14141212WOS:001278697800001SELF-ASSEMBLED MONOLAYERSRUTHENIUM THIN-FILMSBOTTOM-UPINHIBITORIMPACTGROWTHMEDLINE:39057888