Kaushik, V.V.KaushikDe Gendt, StefanStefanDe GendtCaymax, MattyMattyCaymaxYoung, E.E.YoungRöhr, ErikaErikaRöhrVan Elshocht, SvenSvenVan ElshochtDelabie, AnneliesAnneliesDelabieClaes, MartineMartineClaesShi, XiaopingXiaopingShiChen, JerryJerryChenCarter, RichardRichardCarterConard, ThierryThierryConardVandervorst, WilfriedWilfriedVandervorstSchaekers, MarcMarcSchaekersHeyns, MarcMarcHeyns2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7721Compatibility of polysilicon with HfO2-based gate dielectrics for CMOS applicationsProceedings paper