Study of the reliability impact of chlorine precursor residues in the Atomic Layer Deposited HfO2 layers

Cho, Moon JuMoon JuChoDegraeve, RobinRobinDegraevePourtois, GeoffreyGeoffreyPourtoisDelabie, AnneliesAnneliesDelabieRagnarsson, Lars-AkeLars-AkeRagnarssonKauerauf, ThomasThomasKaueraufGroeseneken, GuidoGuidoGroesenekenDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeynsHwang, cheol seongcheol seongHwang2021-10-162021-10-162007-04https://imec-publications.be/handle/20.500.12860/11860Study of the reliability impact of chlorine precursor residues in the Atomic Layer Deposited HfO2 layersJournal article