Electrochemical and analytical study of the Si etching mechanism in HF

Valckx, NickNickValckxVos, RitaRitaVosRip, JensJensRipDoumen, GeertGeertDoumenMertens, PaulPaulMertensBearda, TwanTwanBeardaHeyns, MarcMarcHeynsDe Gendt, StefanStefanDe Gendt2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16342Electrochemical and analytical study of the Si etching mechanism in HFProceedings paperhttp://ecsdl.org/dbt/dbt.jsp?KEY=ECSTF8&Volume=25&Issue=5