Impact of EUV resist thickness on local critical dimension uniformities for sub-30 nm CD Via Patterning

Vincent, BenjaminBenjaminVincentMaslow, MaskMaskMaslowBekaert, JoostJoostBekaertMao, MingMingMaoErvin, JosephJosephErvin2021-10-292021-10-292020https://imec-publications.be/handle/20.500.12860/36275Impact of EUV resist thickness on local critical dimension uniformities for sub-30 nm CD Via PatterningProceedings paperhttps://doi.org/10.1117/12.2551606