Luong, VuVuLuongPhilipsen, VickyVickyPhilipsenOpsomer, KarlKarlOpsomerRip, JensJensRipHendrickx, EricEricHendrickxHeyns, MarcMarcHeynsDetavernier, ChristopheChristopheDetavernierLaubis, ChristianChristianLaubisScholze, FrankFrankScholze2021-10-272021-10-2720191071-1023https://imec-publications.be/handle/20.500.12860/33484Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithographyJournal articlehttps://doi.org/10.1116/1.5125662