Alves Donaton, RicardoRicardoAlves DonatonJin, S.S.JinBender, HugoHugoBenderZagrebnov, MaximMaximZagrebnovBaert, KrisKrisBaertMaex, KarenKarenMaexVantomme, AndreAndreVantommeLangouche, G.G.Langouche2021-09-302021-09-301998https://imec-publications.be/handle/20.500.12860/2337New approaches for formation of ultra-thin PtSi layers for infrared applicationsProceedings paper