Versluijs, JankoJankoVersluijsMisat, Sylvain IrénéeSylvain IrénéeMisatMaenhoudt, MireilleMireilleMaenhoudtGrozev, GrozdanGrozdanGrozevFurusho, TetsunariTetsunariFurusho2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/8383Resolving line collapse in 193nm lithography with surfactinated post develop rinse solutionsProceedings paper